Alexander Pogrebnjak, Volodymyr Ivashchenko, Alexei Onoprienko, Petro Scrynskyy, Oleksander Marchuk, Andrii Kovalchenko
{"title":"偏置电压对直流双磁控溅射沉积Ti-Nb-C薄膜结构和力学性能的影响","authors":"Alexander Pogrebnjak, Volodymyr Ivashchenko, Alexei Onoprienko, Petro Scrynskyy, Oleksander Marchuk, Andrii Kovalchenko","doi":"10.1615/hightempmatproc.2023048628","DOIUrl":null,"url":null,"abstract":"The films of the Ti-Nb-C system were deposited by direct current (DC) magnetron co-sputtering of composite Ti+Nb, and graphite targets onto Si substrates to which negative substrate bias in the range of ‒50÷‒200 V was applied during film deposition. The microstructure, chemical bonds and mechanical properties of films were comparatively investigated. The X-ray diffraction (XRD) analysis revealed that the peaks of the XRD spectra of the film obtained by co-spattering of the composite Ti+Nb and graphite targets are located in intermediate region between the corresponding peaks of the Ti-C and Nb-C films. The X-ray photoelectron spectroscopy (XPS) showed that the Ti-C and Nb-C bonds prevail in the deposited Ti-Nb-C films. It was suggested that the Ti-Nb-C films are nanocomposite and consist of the crystallites of TiC-NbC solid solutions surrounded by amorphous carbon-based matrix. The Knoop hardness of the Ti-Nb-C film is highest (37.5 GPa) in the film deposited at ‒50 V substrate bias. The average friction coefficient determined before film delamination was the lowest (0.12) in that Ti-Nb-C film.","PeriodicalId":50406,"journal":{"name":"High Temperature Material Processes","volume":"124 1","pages":"0"},"PeriodicalIF":0.7000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"INFLUENCE OF BIAS VOLTAGE ON THE STRUCTURE AND MECHANICAL PROPERTIES OF Ti-Nb-C FILMS DEPOSITED BY DC DUAL MAGNETRON SPUTTERING\",\"authors\":\"Alexander Pogrebnjak, Volodymyr Ivashchenko, Alexei Onoprienko, Petro Scrynskyy, Oleksander Marchuk, Andrii Kovalchenko\",\"doi\":\"10.1615/hightempmatproc.2023048628\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The films of the Ti-Nb-C system were deposited by direct current (DC) magnetron co-sputtering of composite Ti+Nb, and graphite targets onto Si substrates to which negative substrate bias in the range of ‒50÷‒200 V was applied during film deposition. The microstructure, chemical bonds and mechanical properties of films were comparatively investigated. The X-ray diffraction (XRD) analysis revealed that the peaks of the XRD spectra of the film obtained by co-spattering of the composite Ti+Nb and graphite targets are located in intermediate region between the corresponding peaks of the Ti-C and Nb-C films. The X-ray photoelectron spectroscopy (XPS) showed that the Ti-C and Nb-C bonds prevail in the deposited Ti-Nb-C films. It was suggested that the Ti-Nb-C films are nanocomposite and consist of the crystallites of TiC-NbC solid solutions surrounded by amorphous carbon-based matrix. The Knoop hardness of the Ti-Nb-C film is highest (37.5 GPa) in the film deposited at ‒50 V substrate bias. The average friction coefficient determined before film delamination was the lowest (0.12) in that Ti-Nb-C film.\",\"PeriodicalId\":50406,\"journal\":{\"name\":\"High Temperature Material Processes\",\"volume\":\"124 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.7000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"High Temperature Material Processes\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1615/hightempmatproc.2023048628\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"High Temperature Material Processes","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1615/hightempmatproc.2023048628","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
INFLUENCE OF BIAS VOLTAGE ON THE STRUCTURE AND MECHANICAL PROPERTIES OF Ti-Nb-C FILMS DEPOSITED BY DC DUAL MAGNETRON SPUTTERING
The films of the Ti-Nb-C system were deposited by direct current (DC) magnetron co-sputtering of composite Ti+Nb, and graphite targets onto Si substrates to which negative substrate bias in the range of ‒50÷‒200 V was applied during film deposition. The microstructure, chemical bonds and mechanical properties of films were comparatively investigated. The X-ray diffraction (XRD) analysis revealed that the peaks of the XRD spectra of the film obtained by co-spattering of the composite Ti+Nb and graphite targets are located in intermediate region between the corresponding peaks of the Ti-C and Nb-C films. The X-ray photoelectron spectroscopy (XPS) showed that the Ti-C and Nb-C bonds prevail in the deposited Ti-Nb-C films. It was suggested that the Ti-Nb-C films are nanocomposite and consist of the crystallites of TiC-NbC solid solutions surrounded by amorphous carbon-based matrix. The Knoop hardness of the Ti-Nb-C film is highest (37.5 GPa) in the film deposited at ‒50 V substrate bias. The average friction coefficient determined before film delamination was the lowest (0.12) in that Ti-Nb-C film.
期刊介绍:
High Temperature Material Processes is an important international publication devoted to original and invited review papers on fundamental and applied re-search and new developments in materials processing and synthesis at high temperatures, especially under the plasma action as well as the treatment by laser, ion and electron beams. Processes of interest include (but not limited to) surface treatments, alloying, coatings production, nanostructures synthesis, welding, cutting, melting, re-melting and purification of metals, metallurgy (among them plasma metallurgy), powder densification, ultra-fine powder production, waste conversion and destruction. In addition, attention is paid to the development, description and study of experimental and industrial systems and devices for the implementation of high-technology plasma and beam processes. Thus, there is a broad range of coverage of experimental, analytical and numerical studies. High Temperature Material Processes will serve the needs of those who develop high temperature processes to produce materials with improved properties, surface treatments or coatings with given specifications, and will also promote connections between laboratories and industry.