GC-ICP-MS用于半导体制造过程和质量控制

IF 0.8 4区 化学 Q4 SPECTROSCOPY
William M. Geiger, Ed McCurdy, Mark Kelinske
{"title":"GC-ICP-MS用于半导体制造过程和质量控制","authors":"William M. Geiger, Ed McCurdy, Mark Kelinske","doi":"10.56530/spectroscopy.cm8586x8","DOIUrl":null,"url":null,"abstract":"Gas chromatography (GC) coupled to inductively coupled plasma–mass spectrometry (ICP-MS) is a powerful and flexible analytical solution that is well-established for measuring organometallic compounds such as organotin, organomercury, and organolead in environmental samples, foodstuffs, and consumer products. GC–ICP-MS is also used for industrial applications, such as monitoring catalyst poisons and environmental contaminant elements in petrochemical processing and plastics manufacturing. The semiconductor industry uses a range of high-purity specialty gases and volatile liquids as precursors in wafer substrate production, and for processes such as plasma etching and deposition of thin films by chemical vapor deposition (CVD). Semiconductor manufacturers are constantly developing new integrated circuit (IC) chips with smaller sizes, higher speeds, lower power consumptions, and greater transistor densities. This trend means that contaminants must be controlled at even lower levels in process chemicals and precursors. In this article, we show how GC–ICP-MS, particularly using triple quadrupole or tandem ICP-MS (ICP-MS/MS), enables determination of the lowest levels of contaminants in the specialty gases and volatile liquids used to make the most advanced electronic devices.","PeriodicalId":21957,"journal":{"name":"Spectroscopy","volume":"60 1","pages":"0"},"PeriodicalIF":0.8000,"publicationDate":"2023-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"GC-ICP-MS for Process and Quality Control in Semiconductor Manufacturing\",\"authors\":\"William M. Geiger, Ed McCurdy, Mark Kelinske\",\"doi\":\"10.56530/spectroscopy.cm8586x8\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Gas chromatography (GC) coupled to inductively coupled plasma–mass spectrometry (ICP-MS) is a powerful and flexible analytical solution that is well-established for measuring organometallic compounds such as organotin, organomercury, and organolead in environmental samples, foodstuffs, and consumer products. GC–ICP-MS is also used for industrial applications, such as monitoring catalyst poisons and environmental contaminant elements in petrochemical processing and plastics manufacturing. The semiconductor industry uses a range of high-purity specialty gases and volatile liquids as precursors in wafer substrate production, and for processes such as plasma etching and deposition of thin films by chemical vapor deposition (CVD). Semiconductor manufacturers are constantly developing new integrated circuit (IC) chips with smaller sizes, higher speeds, lower power consumptions, and greater transistor densities. This trend means that contaminants must be controlled at even lower levels in process chemicals and precursors. In this article, we show how GC–ICP-MS, particularly using triple quadrupole or tandem ICP-MS (ICP-MS/MS), enables determination of the lowest levels of contaminants in the specialty gases and volatile liquids used to make the most advanced electronic devices.\",\"PeriodicalId\":21957,\"journal\":{\"name\":\"Spectroscopy\",\"volume\":\"60 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.8000,\"publicationDate\":\"2023-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Spectroscopy\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.56530/spectroscopy.cm8586x8\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"SPECTROSCOPY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Spectroscopy","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.56530/spectroscopy.cm8586x8","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"SPECTROSCOPY","Score":null,"Total":0}
引用次数: 0

摘要

气相色谱(GC)耦合电感耦合等离子体质谱(ICP-MS)是一种强大而灵活的分析解决方案,用于测量环境样品,食品和消费品中的有机金属化合物,如有机锡,有机汞和有机铅。GC-ICP-MS还用于工业应用,例如监测石化加工和塑料制造中的催化剂毒物和环境污染物元素。半导体行业使用一系列高纯度特种气体和挥发性液体作为晶圆衬底生产的前驱体,并用于等离子体蚀刻和化学气相沉积(CVD)薄膜沉积等工艺。半导体制造商不断开发新的集成电路(IC)芯片,具有更小的尺寸,更高的速度,更低的功耗和更高的晶体管密度。这一趋势意味着必须将加工化学品和前体中的污染物控制在更低的水平。在本文中,我们展示了GC-ICP-MS,特别是使用三重四极杆或串联ICP-MS (ICP-MS/MS),如何能够确定用于制造最先进电子设备的特种气体和挥发性液体中最低水平的污染物。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
GC-ICP-MS for Process and Quality Control in Semiconductor Manufacturing
Gas chromatography (GC) coupled to inductively coupled plasma–mass spectrometry (ICP-MS) is a powerful and flexible analytical solution that is well-established for measuring organometallic compounds such as organotin, organomercury, and organolead in environmental samples, foodstuffs, and consumer products. GC–ICP-MS is also used for industrial applications, such as monitoring catalyst poisons and environmental contaminant elements in petrochemical processing and plastics manufacturing. The semiconductor industry uses a range of high-purity specialty gases and volatile liquids as precursors in wafer substrate production, and for processes such as plasma etching and deposition of thin films by chemical vapor deposition (CVD). Semiconductor manufacturers are constantly developing new integrated circuit (IC) chips with smaller sizes, higher speeds, lower power consumptions, and greater transistor densities. This trend means that contaminants must be controlled at even lower levels in process chemicals and precursors. In this article, we show how GC–ICP-MS, particularly using triple quadrupole or tandem ICP-MS (ICP-MS/MS), enables determination of the lowest levels of contaminants in the specialty gases and volatile liquids used to make the most advanced electronic devices.
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来源期刊
Spectroscopy
Spectroscopy 物理-光谱学
CiteScore
1.10
自引率
0.00%
发文量
0
审稿时长
3 months
期刊介绍: Spectroscopy welcomes manuscripts that describe techniques and applications of all forms of spectroscopy and that are of immediate interest to users in industry, academia, and government.
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