{"title":"基于软有机氟表面选择性沉积的金属图案制备","authors":"Tsuyoshi Tsujioka","doi":"10.1116/6.0002832","DOIUrl":null,"url":null,"abstract":"Metal-pattern formation using vacuum evaporation is a critical process from basic research to industrial mass-production. Selective metal deposition using metal-atom desorption from an organic surface is a promising metal-patterning method by maskless vacuum deposition. In this study, we demonstrate metal-pattern formation by maskless deposition for various metal species using a vacuum-depositable and printable perfluoropolyether (PFPE) based material. A PFPE-based film has a low dispersion component of surface free energy and surface softness, and its surface has the ability to efficiently desorb for various metals. This method, which enables metal-pattern formation using maskless vacuum deposition for a variety of metal species with a high melting point and low intrinsic vapor pressure, including Ag, Cr, and Ni, can be applied to such applications as electrode-pattern formations.","PeriodicalId":17571,"journal":{"name":"Journal of Vacuum Science and Technology","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Metal-pattern preparation based on selective deposition using soft organofluorine surfaces\",\"authors\":\"Tsuyoshi Tsujioka\",\"doi\":\"10.1116/6.0002832\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Metal-pattern formation using vacuum evaporation is a critical process from basic research to industrial mass-production. Selective metal deposition using metal-atom desorption from an organic surface is a promising metal-patterning method by maskless vacuum deposition. In this study, we demonstrate metal-pattern formation by maskless deposition for various metal species using a vacuum-depositable and printable perfluoropolyether (PFPE) based material. A PFPE-based film has a low dispersion component of surface free energy and surface softness, and its surface has the ability to efficiently desorb for various metals. This method, which enables metal-pattern formation using maskless vacuum deposition for a variety of metal species with a high melting point and low intrinsic vapor pressure, including Ag, Cr, and Ni, can be applied to such applications as electrode-pattern formations.\",\"PeriodicalId\":17571,\"journal\":{\"name\":\"Journal of Vacuum Science and Technology\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0002832\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0002832","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Metal-pattern preparation based on selective deposition using soft organofluorine surfaces
Metal-pattern formation using vacuum evaporation is a critical process from basic research to industrial mass-production. Selective metal deposition using metal-atom desorption from an organic surface is a promising metal-patterning method by maskless vacuum deposition. In this study, we demonstrate metal-pattern formation by maskless deposition for various metal species using a vacuum-depositable and printable perfluoropolyether (PFPE) based material. A PFPE-based film has a low dispersion component of surface free energy and surface softness, and its surface has the ability to efficiently desorb for various metals. This method, which enables metal-pattern formation using maskless vacuum deposition for a variety of metal species with a high melting point and low intrinsic vapor pressure, including Ag, Cr, and Ni, can be applied to such applications as electrode-pattern formations.