Al2O3原子层沉积对六甲基二硅烷等离子体聚合物薄膜微孔密封的互补光谱和电化学分析

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL
Xiaofan Xie, David Zanders, Florian Preischel, Teresa de los Arcos, Anjana Devi, Guido Grundmeier
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引用次数: 0

摘要

在本研究中,采用光谱分析和电化学分析相结合的方法,研究了氧等离子体处理和随后的原子层沉积2nm薄Al 2o3薄膜在约30 nm厚的六甲基二氮化硅聚合物层上的影响。研究的重点是相应薄膜的微孔隙度及其结构变化。经氧等离子体处理后,膜表面近区转化为SiO - x,微孔隙度增大。在等离子体氧化膜上沉积Al 2o3原子层,使膜孔尺寸减小,具有良好的密封效果。利用椭偏孔隙度法和原位傅里叶变换红外光谱(FTIR)建立了膜微孔隙度和膜羟基变化与水吸附的相关性。此外,电化学分析还提供了不同条件下薄膜中电解质吸收的补充信息。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition
In the present study, the effects of oxygen plasma treatment and subsequent 2 nm thin Al 2 O 3 film deposition by atomic layer deposition on about 30 nm thick hexamethyldisilazane polymer layers are investigated by using a combination of spectroscopic and electrochemical analysis. The investigations focus on the microporosity of the corresponding films and their structural changes. Upon oxygen plasma treatment, the surface near region of the films is converted into SiO x , and the microporosity is increased. Atomic layer deposition of Al 2 O 3 on the plasma oxidized films leads to the decrease of pore sizes and an effective sealing. A correlation between the film microporosity and the change of hydroxyl groups of the films with the adsorption of water was established by ellipsometric porosimetry and in situ Fourier transform infrared (FTIR) spectroscopy. Moreover, electrochemical analysis provided complementary information on the electrolyte up‐take in the differently conditioned thin films.
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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