AIN/AlxGa1-xN谐振隧道二极管

O. Botsula, E. Prokhorov, A. Suzdaltsev, A. V. Djadchenko
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引用次数: 0

摘要

本研究探讨了在共振隧道二极管(RTD)中使用氮化合物的可能性。给出了以AlxGa1-xN量子阱和AlN为势垒层的RTD的I-V特性和透射系数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AIN/AlxGa1-xN Resonance-Tunnel Diodes
This work investigates the possibilities of using nitrogen compounds for resonance-tunnel diodes (RTD). The I-V characteristics and transmission coefficient of RTD using AlxGa1-xN quantum well and AlN as barrier layer are presented.
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