真空电子束辐照CuCr电极的击穿特性

2011 1st International Conference on Electric Power Equipment - Switching Technology Pub Date : 2011-10-01 DOI:10.1109/ICEPE-ST.2011.6122945

N. Asari, Yo Sasaki, T. Shioiri, J. Sato, M. Homma

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引用次数: 5

摘要

提高真空断路器等高压设备在真空环境下的介电击穿特性对其发展具有十分重要的意义。因此，有必要澄清真空中的击穿机制。众所周知，这些特性受电极材料及其表面状况[1][2]的影响，但击穿机理尚未明确。本文介绍了电子束辐照后的击穿特性测量和截面观察。并与无电子束辐照的结果进行了比较。结果表明，经过电子束辐照的CuCr电极击穿电压高于未经过电子束辐照的击穿电压。这是因为在电极表面形成了一层精细的铬层。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Breakdown characteristics of CuCr electrode after electron beam irradiation in vacuum

For development of high-voltage equipment such as vacuum circuit breakers, it is very important to improve their dielectric breakdown characteristics in a vacuum. It is thus necessary to clarify the breakdown mechanism in a vacuum. It is well-known that these characteristics are influenced by the electrode material and its surface condition[1][2], but the breakdown mechanism has not been clarified. This paper presents measurements of breakdown characteristics and observations of a cross-section after electron beam irradiation. The results are compared with those for no electron beam irradiation. It is thus shown that the breakdown voltage of a CuCr electrode after electron beam irradiation is higher than that for no electron beam irradiation. This is because a fine Cr layer is formed on the electrode surface.

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2011 1st International Conference on Electric Power Equipment - Switching Technology

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