GaAsN涂层中辐射复合的性质

B. Sun, M. Gal, Q. Gao, H. Tan, C. Jagadish
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引用次数: 0

摘要

基于光致发光信号的上升时间比预期的局域激子的上升时间短两个数量级,我们认为GaAsN薄膜中的辐射复合发生在局域电子和非局域空穴之间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Properties of radiative recombination in GaAsN epilayers
In this short note, we suggest that the radiative recombination in GaAsN epilayers takes place between localized electrons and delocalized holes, based on the risetime of the photoluminescence signal is more than two orders of magnitude shorter than that expected localized excitons.
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