银种层上铜电路绝缘可靠性的理论研究

Hiroyuki Hagiwara, S. Niibayashi, Norimasa Fukazawa, Wataru Fujikawa, Jun Shirakami, Yudai Yoshimura, Kaishi Miyazaki, Isao Shitanda
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引用次数: 0

摘要

采用电化学测量方法研究了银籽层电路高绝缘可靠性的机理。银种镀体系的组成金属(银与铜的结合)的溶解行为表明,铜的存在抑制了银的溶解。此外,还证实了银的存在并不会加速铜的溶解。我们得出结论,这些金属溶解行为对提高银种子上铜电路的绝缘可靠性起着重要作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Theoretical Study on Insulation Reliability of Copper Circuits on Silver-Seed Layer
Mechanism of high insulation reliability of the circuits fabricated on silver-seed layer was investigated by the electrochemical measurement. The dissolution behavior of constituent metal of silver seed plating system (combination of silver and copper) showed the suppression of silver dissolution by existence of copper. Furthermore, it is also confirmed that the existence of silver does not accelerate the copper dissolution. We concluded that these metal dissolution behaviors play an important role in improving the insulation reliability of copper circuits on silver-seeds.
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