M. Kadlecíková, M. Kolmačka, F. Lazišťan, J. Breza, K. Jesenák, K. Pastorková, D. Durackova
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The principle of a new thermometer in HF CVD reactor
The topic of the submitted article is the issue of measuring the temperature in a hot filament chemical vapour deposition (HF CVD) reactor by a purpose-built electronic circuit. The topical objective is to optimize the substrate temperature, one of the key technological parameters in the synthesis of carbon nanotubes. Design and construction of a functional thermometer and its calibration and, hereby, improved accuracy of temperature measurement is the main outcome of this experimental work.
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