InAlAs/InGaAS双栅与标准hemt的蒙特卡罗比较

B. G. Vasallo, T. González, D. Pardo, J. Mateos, N. Wichmann, S. Bollaert, A. Cappy
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引用次数: 0

摘要

利用集成二维蒙特卡罗仿真器对InAlAs/ InGaAs双栅高电子迁移率晶体管(dg - hemt)的静态和动态性能进行了分析,并与标准单栅高电子迁移率晶体管(SG)进行了比较。为了检查dg结构中预期的短通道效应衰减,分析了不同栅极长度的器件。通过dg的几何形状,证实了跨导gm和输出导gd的改善。此外,较高的品质系数gm / gd与较低的栅极电阻Rg共同导致外在频率性能(fmax和ft)的改善。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Monte Carlo Comparison Between InAlAs/InGaAS Double-Gate and Standard HEMTs
An ensemble 2D Monte Carlo simulator is employed to analyze the static and dynamic performance of InAlAs/ InGaAs double-gate high electron mobility transistors (DG-HEMTs) by comparing them with standard single-gate (SG) ones. Different gate length devices are analyzed in order to check the attenuation of short-channel effects expected in the DG-structures. The transconductance gm and the output conductance gd are confirmed to be improved by the DG-geometry. As well, the higher values of the figure of merit gm / gd jointly with the lower value of the gate resistance Rg lead to an improvement of the extrinsic frequency performance (fmax and ft).
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