水热法和湿法蚀刻制备纳米树阵列乙醇气体传感器

2017 Silicon Nanoelectronics Workshop (SNW) Pub Date : 2017-06-01 DOI:10.23919/SNW.2017.8242326

Feng-Renn Juang, C. Hsaio

{"title":"水热法和湿法蚀刻制备纳米树阵列乙醇气体传感器","authors":"Feng-Renn Juang, C. Hsaio","doi":"10.23919/SNW.2017.8242326","DOIUrl":null,"url":null,"abstract":"Highly sensitive nanotree arrays are developed on silicon by combining wet etching and hydrothermal method. Due to the large surface-to-volume ratio, the device has relative sensitivity ratio of −82% to 100ppm ethanol gas under 150°C. The response and recovery times are also shortened significantly.","PeriodicalId":424135,"journal":{"name":"2017 Silicon Nanoelectronics Workshop (SNW)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ethanol gas sensor with nanotree arrays by hydrothermal method and wet etching\",\"authors\":\"Feng-Renn Juang, C. Hsaio\",\"doi\":\"10.23919/SNW.2017.8242326\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Highly sensitive nanotree arrays are developed on silicon by combining wet etching and hydrothermal method. Due to the large surface-to-volume ratio, the device has relative sensitivity ratio of −82% to 100ppm ethanol gas under 150°C. The response and recovery times are also shortened significantly.\",\"PeriodicalId\":424135,\"journal\":{\"name\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/SNW.2017.8242326\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SNW.2017.8242326","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

采用湿法蚀刻与水热法相结合的方法，在硅表面制备了高灵敏度的纳米树阵列。由于表面积体积比大，该装置在150℃下对100ppm乙醇气体的相对灵敏度比为- 82%。响应和恢复时间也大大缩短。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Ethanol gas sensor with nanotree arrays by hydrothermal method and wet etching

Highly sensitive nanotree arrays are developed on silicon by combining wet etching and hydrothermal method. Due to the large surface-to-volume ratio, the device has relative sensitivity ratio of −82% to 100ppm ethanol gas under 150°C. The response and recovery times are also shortened significantly.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2017 Silicon Nanoelectronics Workshop (SNW)

自引率

0.00%

发文量