大规模集成电路制造质量控制与诊断系统

International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM Pub Date : 1994-06-21 DOI:10.1109/ISSM.1994.729451

M. Sakata, S. Ishikawa, I. Miyazaki, T. Okabe

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引用次数: 1

摘要

提高初始产率是克服半导体市场竞争日益激烈的方法之一。要做到这一点，分析粒子/图案缺陷是找到对策的一种方法。我们开发了一个系统，从控制主参数设置，得出问题在哪里和什么。从QC数据中收集数据;特别是与颗粒和图案缺陷有关。该系统完全独立于其他系统，因此可以在任何类型的线路中使用。unautomated /自动化,大/小。)

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Quality Control And Diagnostic System For LSI Fabrication

Improving initial yield is one way to overcome the ever competitive market of semiconductors. To accomplish this, analyzing particle/pattern defects is a method in finding a countermeasure. We have developed a system, from controlling the master parameter setting, derive where and what the problem is. It gathers data from QC data; especially related to particles and pattern defects. This system is completely independent from other systems, thus enabling it to be used in any type of line(e.g. unautomated/automated, large/small.)

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International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM

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