基于BV和(VFQ)−1协同优化的保护环终端GaN-on-GaN二极管快速逆设计

Nathan Yee, A. Lu, Y. Wang, M. Porter, Yuhao Zhang, H. Wong
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引用次数: 2

摘要

GaN-on-GaN垂直二极管是下一代电力电子器件中很有前途的器件。它的击穿电压(BV)受到保护环等边缘终端设计的限制。保护环设计空间大,人工优化难度大。在本文中,我们提出了一种有效的反向设计策略来共同优化BV和(VFQ)−1,其中BV, VF和Q分别是二极管的击穿电压,正向电压和预留电容电荷。利用快速技术计算机辅助设计(TCAD)仿真、神经网络(NN)和帕累托前生成,GaN-on-GaN二极管在24小时内优化。我们可以在中等(VFQ)−1下获得比最佳随机生成的TCAD数据高200V的BV结构,或者找到比最佳随机生成的TCAD数据高25%的BV /Ron的接近理想的BV结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Rapid Inverse Design of GaN-on-GaN Diode with Guard Ring Termination for BV and (VFQ)−1 Co-Optimization
GaN-on-GaN vertical diode is a promising device for next-generation power electronics. Its breakdown voltage (BV) is limited by edge termination designs such as guard rings. The design space of guard rings is huge and it is difficult to optimize manually. In this paper, we propose an effective inverse design strategy to co-optimize BV and (VFQ)−1, where BV, VF, and Q are the breakdown voltage, forward voltage, and reserve capacitive charge of the diode, respectively. Using rapid Technology Computer-Aided-Design (TCAD) simulations, neural network (NN), and Pareto front generation, a GaN-on-GaN diode is optimized within 24 hours. We can obtain structures with 200V higher BV at medium (VFQ)−1 or find a nearly ideal BV structure with 25% higher BV2/Ron compared to the best randomly generated TCAD data.
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