半导体研发设施的成功建模

B. Tullis, Vijay Mehrotra, D. Zuanich
{"title":"半导体研发设施的成功建模","authors":"B. Tullis, Vijay Mehrotra, D. Zuanich","doi":"10.1109/ISMSS.1990.66131","DOIUrl":null,"url":null,"abstract":"A chief limitation on process development cycle time is the time it takes to process wafers. Hewlett Packard Co. has shortened this time by using discrete-event simulation of its R&D fabrication facility to better understand its capacity limitations and to analyze how changes affect the cycle times of complete wafer processing. Results include Pareto charts of equipment according to the impacts that changes in their mean-time-between-failure (MTBF) and/or mean-time-to-repair (MTTR) parameters have on wafer cycle times. Results also include a Pareto chart of operator skills and their impact on cycle times; that is, one can know how much effect there is on cycle times when staffing is changed to satisfy needs for a specific operator skill. Similarly, it is possible to evaluate effects of shift schedules and end-of-shift wafer processing decisions. Furthermore, simulation reveals the relative benefits of applying different dispatching rules (such as first in, first out, shortest-processing time, least-work-in-next queue, etc.) and of different inventory-level control policies.<<ETX>>","PeriodicalId":398535,"journal":{"name":"IEEE/SEMI International Symposium on Semiconductor Manufacturing Science","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":"{\"title\":\"Successful modeling of a semiconductor R&D facility\",\"authors\":\"B. Tullis, Vijay Mehrotra, D. Zuanich\",\"doi\":\"10.1109/ISMSS.1990.66131\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A chief limitation on process development cycle time is the time it takes to process wafers. Hewlett Packard Co. has shortened this time by using discrete-event simulation of its R&D fabrication facility to better understand its capacity limitations and to analyze how changes affect the cycle times of complete wafer processing. Results include Pareto charts of equipment according to the impacts that changes in their mean-time-between-failure (MTBF) and/or mean-time-to-repair (MTTR) parameters have on wafer cycle times. Results also include a Pareto chart of operator skills and their impact on cycle times; that is, one can know how much effect there is on cycle times when staffing is changed to satisfy needs for a specific operator skill. Similarly, it is possible to evaluate effects of shift schedules and end-of-shift wafer processing decisions. Furthermore, simulation reveals the relative benefits of applying different dispatching rules (such as first in, first out, shortest-processing time, least-work-in-next queue, etc.) and of different inventory-level control policies.<<ETX>>\",\"PeriodicalId\":398535,\"journal\":{\"name\":\"IEEE/SEMI International Symposium on Semiconductor Manufacturing Science\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-05-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI International Symposium on Semiconductor Manufacturing Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISMSS.1990.66131\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI International Symposium on Semiconductor Manufacturing Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISMSS.1990.66131","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

摘要

工艺开发周期的主要限制是处理晶圆所需的时间。惠普公司(Hewlett Packard Co.)通过对其研发制造设施进行离散事件模拟来缩短这一时间,以更好地了解其产能限制,并分析变化如何影响整个晶圆加工的周期时间。结果包括根据设备平均故障间隔时间(MTBF)和/或平均维修时间(MTTR)参数变化对晶圆周期时间的影响绘制的帕累托图。结果还包括操作员技能的帕累托图及其对周期时间的影响;也就是说,当为了满足特定操作员技能的需要而改变人员配置时,可以知道对周期时间有多大影响。同样,也可以评估轮班计划和轮班结束晶圆加工决策的影响。此外,仿真还揭示了应用不同调度规则(如先进先出、最短处理时间、下一个队列中最少工作等)和不同库存级控制策略的相对好处。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Successful modeling of a semiconductor R&D facility
A chief limitation on process development cycle time is the time it takes to process wafers. Hewlett Packard Co. has shortened this time by using discrete-event simulation of its R&D fabrication facility to better understand its capacity limitations and to analyze how changes affect the cycle times of complete wafer processing. Results include Pareto charts of equipment according to the impacts that changes in their mean-time-between-failure (MTBF) and/or mean-time-to-repair (MTTR) parameters have on wafer cycle times. Results also include a Pareto chart of operator skills and their impact on cycle times; that is, one can know how much effect there is on cycle times when staffing is changed to satisfy needs for a specific operator skill. Similarly, it is possible to evaluate effects of shift schedules and end-of-shift wafer processing decisions. Furthermore, simulation reveals the relative benefits of applying different dispatching rules (such as first in, first out, shortest-processing time, least-work-in-next queue, etc.) and of different inventory-level control policies.<>
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