垂直NPN晶体管的总电离剂量数据集

D. Adams, H. A. Barnes, N.P. Goldstein, D. Harms, Jereimah J. Horner, Cory E. Sherman, Craig Stodart
{"title":"垂直NPN晶体管的总电离剂量数据集","authors":"D. Adams, H. A. Barnes, N.P. Goldstein, D. Harms, Jereimah J. Horner, Cory E. Sherman, Craig Stodart","doi":"10.1109/REDW.2014.7004510","DOIUrl":null,"url":null,"abstract":"A Total Ionizing Dose (TID) study was performed on vertical NPN bipolar transistors used in two radiation hardened 10V and 40V BiCMOS processing technologies. The data shows increased total dose degradation with decreasing base doping concentration. Testing was performed at both high [90 rad(Si)/sec] and low [0.1 rad(Si)/sec] dose rates with minimal differences noted at the lower dose rate. The primary finding from this study was that, with proper device modeling and selection of device operating currents, these devices are suitable for 300 krad(Si) mixed signal applications.","PeriodicalId":223557,"journal":{"name":"2014 IEEE Radiation Effects Data Workshop (REDW)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A Total Ionizing Dose Dataset for Vertical NPN Transistors\",\"authors\":\"D. Adams, H. A. Barnes, N.P. Goldstein, D. Harms, Jereimah J. Horner, Cory E. Sherman, Craig Stodart\",\"doi\":\"10.1109/REDW.2014.7004510\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A Total Ionizing Dose (TID) study was performed on vertical NPN bipolar transistors used in two radiation hardened 10V and 40V BiCMOS processing technologies. The data shows increased total dose degradation with decreasing base doping concentration. Testing was performed at both high [90 rad(Si)/sec] and low [0.1 rad(Si)/sec] dose rates with minimal differences noted at the lower dose rate. The primary finding from this study was that, with proper device modeling and selection of device operating currents, these devices are suitable for 300 krad(Si) mixed signal applications.\",\"PeriodicalId\":223557,\"journal\":{\"name\":\"2014 IEEE Radiation Effects Data Workshop (REDW)\",\"volume\":\"65 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-07-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE Radiation Effects Data Workshop (REDW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/REDW.2014.7004510\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Radiation Effects Data Workshop (REDW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/REDW.2014.7004510","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

研究了垂直NPN双极晶体管在10V和40V两种辐射硬化BiCMOS加工工艺中的总电离剂量(TID)。数据显示,随着碱掺杂浓度的降低,总剂量衰减增加。在高剂量率[90拉德(Si)/秒]和低剂量率[0.1拉德(Si)/秒]下进行测试,在较低剂量率下发现差异最小。本研究的主要发现是,通过适当的器件建模和器件工作电流的选择,这些器件适用于300克拉(Si)混合信号应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Total Ionizing Dose Dataset for Vertical NPN Transistors
A Total Ionizing Dose (TID) study was performed on vertical NPN bipolar transistors used in two radiation hardened 10V and 40V BiCMOS processing technologies. The data shows increased total dose degradation with decreasing base doping concentration. Testing was performed at both high [90 rad(Si)/sec] and low [0.1 rad(Si)/sec] dose rates with minimal differences noted at the lower dose rate. The primary finding from this study was that, with proper device modeling and selection of device operating currents, these devices are suitable for 300 krad(Si) mixed signal applications.
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