用于等离子体离子注入和沉积的双开关模式脉冲调制器

Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Pub Date : 2002-06-30 DOI:10.1109/MODSYM.2002.1189536

K. Yukimura, K. Matsunaga

{"title":"用于等离子体离子注入和沉积的双开关模式脉冲调制器","authors":"K. Yukimura, K. Matsunaga","doi":"10.1109/MODSYM.2002.1189536","DOIUrl":null,"url":null,"abstract":"A new-concept pulse modulator was developed for a plasma-based ion implantation (PBII) system, where two hard-tubes as a main switch are running in parallel to increase current capacity for outputting the pulse voltage and another two hard-tubes are used for releasing the charges stored in the stray and ion sheath-capacitor. A maximum output voltage is 40 kV with an average current of 20 A, where the pulse width is varied from 2 /spl mu/s to 100 /spl mu/s. The rise time less than 1 /spl mu/s at an output voltage of 40 kV and a maximum repetition rate of 2.5 kHz.","PeriodicalId":339166,"journal":{"name":"Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.","volume":"412 3","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A two-switch mode pulse modulator for plasma-based ion implantation and deposition\",\"authors\":\"K. Yukimura, K. Matsunaga\",\"doi\":\"10.1109/MODSYM.2002.1189536\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new-concept pulse modulator was developed for a plasma-based ion implantation (PBII) system, where two hard-tubes as a main switch are running in parallel to increase current capacity for outputting the pulse voltage and another two hard-tubes are used for releasing the charges stored in the stray and ion sheath-capacitor. A maximum output voltage is 40 kV with an average current of 20 A, where the pulse width is varied from 2 /spl mu/s to 100 /spl mu/s. The rise time less than 1 /spl mu/s at an output voltage of 40 kV and a maximum repetition rate of 2.5 kHz.\",\"PeriodicalId\":339166,\"journal\":{\"name\":\"Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.\",\"volume\":\"412 3\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-06-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MODSYM.2002.1189536\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MODSYM.2002.1189536","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 4

摘要

为等离子体离子注入(PBII)系统设计了一种新型脉冲调制器，该调制器采用两根硬管并联作为主开关来增加输出脉冲电压的电流容量，另外两根硬管用于释放存储在杂散和离子鞘电容器中的电荷。最大输出电压为40kv，平均电流为20a，脉冲宽度从2 /压升亩/秒到100 /压升亩/秒不等。在输出电压为40 kV，最大重复频率为2.5 kHz时，上升时间小于1 /spl mu/s。

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A two-switch mode pulse modulator for plasma-based ion implantation and deposition

A new-concept pulse modulator was developed for a plasma-based ion implantation (PBII) system, where two hard-tubes as a main switch are running in parallel to increase current capacity for outputting the pulse voltage and another two hard-tubes are used for releasing the charges stored in the stray and ion sheath-capacitor. A maximum output voltage is 40 kV with an average current of 20 A, where the pulse width is varied from 2 /spl mu/s to 100 /spl mu/s. The rise time less than 1 /spl mu/s at an output voltage of 40 kV and a maximum repetition rate of 2.5 kHz.

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Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.

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