271 nm脉冲高重复率低强度激光对增殖和静止肿瘤HeLa细胞的不同反应

Laser Chemistry Pub Date : 1900-01-01 DOI:10.1155/LC.1.153

T. Karu, G. Kalendo, V. Letokhov, V. Lobko

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引用次数: 2

摘要

研究了高重复频率脉冲紫外激光(2次谐波Cu蒸气激光，λ = 271 nm，脉冲持续时间18 nsec，重复频率10 kHz)对HeLa细胞增殖和静息的作用。这两种细胞的DNA合成强度在辐照后都发生了变化。对于增殖细胞，DNA合成受到抑制，而对于静止细胞，在0.05至5 J/m2的剂量范围内观察到刺激。

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Different Responses of Proliferating and Resting Tumor HeLa Cells to Pulsed High Repetition Rate Low-Intensity Laser Light at 271 nm

The action of pulsed high repetition rate UV laser radiation (2-nd harmonic of Cu vapor laser, λ = 271 nm, pulse duration 18 nsec, repetition rate 10 kHz) on proliferating and resting HeLa cells has been studied. The intensity of DNA synthesis changes after such kinds of irradiation for both types of cells. For proliferating cells DNA synthesis is suppressed, while for the resting ones stimulation is observed in the dose range from 0.05 to 5 J/m2.

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Laser Chemistry

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