用于制造微图案表面和微流控通道的lcd -投影仪无掩模曝光装置的研制

2007 International Symposium on Micro-NanoMechatronics and Human Science Pub Date : 2007-11-01 DOI:10.1109/MHS.2007.4420846

K. Itoga, J. Kobayashi, Y. Tsuda, M. Yamato, A. Kikuchi, T. Okano

{"title":"用于制造微图案表面和微流控通道的lcd -投影仪无掩模曝光装置的研制","authors":"K. Itoga, J. Kobayashi, Y. Tsuda, M. Yamato, A. Kikuchi, T. Okano","doi":"10.1109/MHS.2007.4420846","DOIUrl":null,"url":null,"abstract":"A newly developed device for photolithography of micropatterns without the preparation of photomasks by a modified, commercially available liquid crystal display projector (LCDP) was reported. The novel devise was equipped with an XY positioning stage, sliding system for variable focal distance, and exchangeable objective lens, facilitating the exposure of micropatterns with large area and variable resolution.","PeriodicalId":161669,"journal":{"name":"2007 International Symposium on Micro-NanoMechatronics and Human Science","volume":"237 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Development of the Maskless Exposure Device equipped with a LCD-Projector for Fabrication of Micropatterned Surfaces and Microfluidic Channels\",\"authors\":\"K. Itoga, J. Kobayashi, Y. Tsuda, M. Yamato, A. Kikuchi, T. Okano\",\"doi\":\"10.1109/MHS.2007.4420846\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A newly developed device for photolithography of micropatterns without the preparation of photomasks by a modified, commercially available liquid crystal display projector (LCDP) was reported. The novel devise was equipped with an XY positioning stage, sliding system for variable focal distance, and exchangeable objective lens, facilitating the exposure of micropatterns with large area and variable resolution.\",\"PeriodicalId\":161669,\"journal\":{\"name\":\"2007 International Symposium on Micro-NanoMechatronics and Human Science\",\"volume\":\"237 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 International Symposium on Micro-NanoMechatronics and Human Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MHS.2007.4420846\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 International Symposium on Micro-NanoMechatronics and Human Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MHS.2007.4420846","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 4

摘要

报道了一种新型的不制备光掩膜的微图案光刻装置，该装置是由一种改良的市售液晶显示投影仪(LCDP)制成的。该装置配备了XY定位台、可变焦距滑动系统和可更换物镜，便于大面积变分辨率微图案的曝光。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Development of the Maskless Exposure Device equipped with a LCD-Projector for Fabrication of Micropatterned Surfaces and Microfluidic Channels

A newly developed device for photolithography of micropatterns without the preparation of photomasks by a modified, commercially available liquid crystal display projector (LCDP) was reported. The novel devise was equipped with an XY positioning stage, sliding system for variable focal distance, and exchangeable objective lens, facilitating the exposure of micropatterns with large area and variable resolution.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2007 International Symposium on Micro-NanoMechatronics and Human Science

自引率

0.00%

发文量