{"title":"铁电和准电场效应管的动态特性研究","authors":"A.Sai Kumar, M. M. De Souza","doi":"10.1109/EDTM.2018.8421493","DOIUrl":null,"url":null,"abstract":"We derive the necessary conditions for a steep subthreshold switching of a Paraelectric FET with gate scan frequency. Despite an absence of a two-valley energy profile, paraelectric FETs can be represented by a series R-C circuit that exhibit sub-60 mV/dec switching under dynamic conditions during the reverse sweep of the gate bias.","PeriodicalId":418495,"journal":{"name":"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)","volume":"61 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"On the Dynamic characteristics of Ferroelectric and Paraelectric FETs\",\"authors\":\"A.Sai Kumar, M. M. De Souza\",\"doi\":\"10.1109/EDTM.2018.8421493\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We derive the necessary conditions for a steep subthreshold switching of a Paraelectric FET with gate scan frequency. Despite an absence of a two-valley energy profile, paraelectric FETs can be represented by a series R-C circuit that exhibit sub-60 mV/dec switching under dynamic conditions during the reverse sweep of the gate bias.\",\"PeriodicalId\":418495,\"journal\":{\"name\":\"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)\",\"volume\":\"61 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDTM.2018.8421493\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDTM.2018.8421493","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On the Dynamic characteristics of Ferroelectric and Paraelectric FETs
We derive the necessary conditions for a steep subthreshold switching of a Paraelectric FET with gate scan frequency. Despite an absence of a two-valley energy profile, paraelectric FETs can be represented by a series R-C circuit that exhibit sub-60 mV/dec switching under dynamic conditions during the reverse sweep of the gate bias.