用于测量晶圆内均匀性的可靠度量

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' Pub Date : 1995-10-02 DOI:10.1109/IEMT.1995.526193

J.C. Davis, R. S. Gyurcsik, Jye-Chi Lu, J. Hughes-Oliver, D. Nychka

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引用次数: 9

摘要

开发了一种测量晶圆内均匀性的鲁棒度量，并与传统的信噪比度量进行了比较。新的统计量，称为积分统计量，是基于目标和实际表面之间的体积误差的积分。与传统信噪比均匀度度量的比较表明，积分统计量对不同测量次数和不同测量方向的均匀性提供了更一致的估计。

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A robust metric for measuring within-wafer uniformity

A robust metric for measuring within-wafer uniformity has been developed and compared to the traditional SNR metric. The new statistic, referred to as the integration statistic, is based on the integration of the volumetric error between the target and the actual surfaces. Comparison with the traditional SNR uniformity metric indicates that the integration statistic provides a more consistent estimate of the uniformity for different numbers of measurements and different orientations of those measurements to the uniformity pattern.

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来源期刊

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'

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