一种低电压低功耗深亚阈值5-T SRAM单元的新方法

P. Shrivastava, Prashant Kumar, Manish Tiwari, Amit Dhawan
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引用次数: 1

摘要

本文介绍了一种新的低功耗、高静态噪声裕度(SNM)深亚阈值5-T SRAM单元,该单元可以在低于器件阈值的情况下正常工作,采用深亚微米- 13μm CMOS技术。新设计与6T SRAM单元略有不同[15]。该设计在(1.2-1.8)伏供电电压下,功耗平均降低36.11%,静态噪声裕度(SNM)平均提高106.60%。与现有的6T SRAM电池相比,当我们将电源电压降低到1.2伏以下时,功耗的降低和SNM的改善就会增加。(即亚阈值电压)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A novel approach for Low Voltage, Low Power deep Sub-threshold 5-T SRAM cell
In this paper, we introduce a new low power & high static noise margin (SNM) deep sub-threshold 5-T SRAM cell which can be operated properly below the threshold value of devices in deep submicron .13μm CMOS technology. The new design is slightly different to 6T SRAM cell [15]. This design achieves an average 36.11% reduction in power dissipation for (1.2–1.8) volt supply voltage and achieves an average 106.60% improvement in static noise margin (SNM) for the same supply voltage. The reduction in power dissipation and improvement of SNM increases when we reduce the supply voltage below the 1.2 volts compared to existing 6T SRAM cell. (i.e. sub-threshold voltage).
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