电离辐射对霍尼韦尔HTMOS高温线性CMOS技术的影响

D. Larsen, P. Welling, W. Tsacoyeanes
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引用次数: 2

摘要

研究了霍尼韦尔HTMOS 10v线性技术对总电离剂量的高剂量率瞬态响应和辐射硬度。虽然这项技术是为高温应用而设计的,但所有的辐照和测量都是在室温下进行的。结果表明,HT1104四元运算放大器和HT1204四元模拟开关的存活时间为5/spl次/10/sup / 11/ rads(Si)/s,恢复时间为/spl次/10/ spl mu/s。虽然所有器件的功能都达到1 Mrad(SiO/sub 2/),但观察到IC电流参数显着增加。HT1204断态泄漏电流从制造商规格下降了100克拉(SiO/sub 2/)。这项工作表明,尽管来自强化CMOS/SOI技术的线性ic可以在高剂量率下保持锁相免疫和快速恢复,但在改变工艺以适应高温应用的同时,维持总剂量硬度并非易事。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effects of ionizing radiation on the Honeywell HTMOS high temperature linear CMOS technology
The high dose-rate transient response and radiation hardness to total ionizing dose of Honeywell's HTMOS 10 V linear technology were evaluated. Although this technology was designed for high-temperature applications, all irradiation and measurements herein were performed at room temperature. Results show that the HT1104 Quad Operational Amplifier and HT1204 Quad Analog Switch survive 5/spl times/10/sup 11/ rads(Si)/s, with recovery times /spl les/10 /spl mu/s. Although all devices were functional to 1 Mrad(SiO/sub 2/), significant increases in IC current parameters were observed. The HT1204 off-state leakage current fell from manufacturer specification by 100 krads(SiO/sub 2/). This work suggests that although linear ICs derived from a hardened CMOS/SOI technology sustain latch-up immunity and fast recovery from high dose rates, it is nontrivial to sustain total dose hardness, while modifying processes to accommodate high-temperature applications.
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