薄膜结构面内热性能的热反射成像测量

2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM) Pub Date : 2010-04-08 DOI:10.1109/STHERM.2010.5444284

Xi Wang, A. Shakouri, A. Mavrokefalos, Y. Lee, H. Kong, Li Shi

{"title":"薄膜结构面内热性能的热反射成像测量","authors":"Xi Wang, A. Shakouri, A. Mavrokefalos, Y. Lee, H. Kong, Li Shi","doi":"10.1109/STHERM.2010.5444284","DOIUrl":null,"url":null,"abstract":"The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film inplane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.","PeriodicalId":111882,"journal":{"name":"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Thermoreflectance imaging measurement of in-plane thermal properties of thin-film structures\",\"authors\":\"Xi Wang, A. Shakouri, A. Mavrokefalos, Y. Lee, H. Kong, Li Shi\",\"doi\":\"10.1109/STHERM.2010.5444284\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film inplane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.\",\"PeriodicalId\":111882,\"journal\":{\"name\":\"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/STHERM.2010.5444284\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/STHERM.2010.5444284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

薄膜热性能的研究是微电子和热电材料研究的重要组成部分。准确测量这些特性，特别是平面内导热系数是一项挑战。本文简要回顾了近年来发展起来的薄膜面内热导率测量方法，并利用热反射成像技术论证了一种新的薄膜面内热导率测量方法。描述了一种铟铝砷化镓薄膜样品的初步测量结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Thermoreflectance imaging measurement of in-plane thermal properties of thin-film structures

The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film inplane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)

自引率

0.00%

发文量