Z. Griffith, M. Urteaga, P. Rowell, L. Tran, B. Brar
{"title":"250nm InP HBT的50- 250ghz高增益功率放大器mmic","authors":"Z. Griffith, M. Urteaga, P. Rowell, L. Tran, B. Brar","doi":"10.1109/BCICTS45179.2019.8972777","DOIUrl":null,"url":null,"abstract":"In this paper we review the status of the state-of-the-art and our transition activities for mm-wave, D-, and G-band solid-state power amplifier (PA) MMICs developed into Teledyne Scientific’s 250-nm InP HBT technology. Key design decisions driven by the transistor gain at a given frequency and large-signal load-line are reviewed. Novel PA cell topologies are presented to show how they address the high current biasing required of the 250-nm InP HBT and permit 2× and 4× on-chip combining. PA wafer-mapping by auto-probing on a full thickness 100-mm wafer prior to finishing (thinning to 3-mil, chip singulation) permits the RF identification of known-good-die (KGD) and thus an inventory of parts can be generated. Five established 250-nm InP HBT power amplifiers are presented operating from 55-135 GHz (115-135 mW), 60-130 GHz (160-275 mW), 115-145 GHz (0.25-W @ 140-GHz), 115-185 GHz (75-115 mW), and 180-250 GHz (40-80 mW). Also, included is a novel 190-GHz low-power driver amplifier (high-gain, 100-mW PDC, 3-dBm OP1dB, 11-dBm Psat with 9.6% PAE).","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"50 – 250 GHz High-Gain Power Amplifier MMICs in 250-nm InP HBT\",\"authors\":\"Z. Griffith, M. Urteaga, P. Rowell, L. Tran, B. Brar\",\"doi\":\"10.1109/BCICTS45179.2019.8972777\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we review the status of the state-of-the-art and our transition activities for mm-wave, D-, and G-band solid-state power amplifier (PA) MMICs developed into Teledyne Scientific’s 250-nm InP HBT technology. Key design decisions driven by the transistor gain at a given frequency and large-signal load-line are reviewed. Novel PA cell topologies are presented to show how they address the high current biasing required of the 250-nm InP HBT and permit 2× and 4× on-chip combining. PA wafer-mapping by auto-probing on a full thickness 100-mm wafer prior to finishing (thinning to 3-mil, chip singulation) permits the RF identification of known-good-die (KGD) and thus an inventory of parts can be generated. Five established 250-nm InP HBT power amplifiers are presented operating from 55-135 GHz (115-135 mW), 60-130 GHz (160-275 mW), 115-145 GHz (0.25-W @ 140-GHz), 115-185 GHz (75-115 mW), and 180-250 GHz (40-80 mW). Also, included is a novel 190-GHz low-power driver amplifier (high-gain, 100-mW PDC, 3-dBm OP1dB, 11-dBm Psat with 9.6% PAE).\",\"PeriodicalId\":243314,\"journal\":{\"name\":\"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/BCICTS45179.2019.8972777\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCICTS45179.2019.8972777","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
50 – 250 GHz High-Gain Power Amplifier MMICs in 250-nm InP HBT
In this paper we review the status of the state-of-the-art and our transition activities for mm-wave, D-, and G-band solid-state power amplifier (PA) MMICs developed into Teledyne Scientific’s 250-nm InP HBT technology. Key design decisions driven by the transistor gain at a given frequency and large-signal load-line are reviewed. Novel PA cell topologies are presented to show how they address the high current biasing required of the 250-nm InP HBT and permit 2× and 4× on-chip combining. PA wafer-mapping by auto-probing on a full thickness 100-mm wafer prior to finishing (thinning to 3-mil, chip singulation) permits the RF identification of known-good-die (KGD) and thus an inventory of parts can be generated. Five established 250-nm InP HBT power amplifiers are presented operating from 55-135 GHz (115-135 mW), 60-130 GHz (160-275 mW), 115-145 GHz (0.25-W @ 140-GHz), 115-185 GHz (75-115 mW), and 180-250 GHz (40-80 mW). Also, included is a novel 190-GHz low-power driver amplifier (high-gain, 100-mW PDC, 3-dBm OP1dB, 11-dBm Psat with 9.6% PAE).