体系垂直MOSFET的特性

Kuan-Yu Lu, Jyi-Tsong Lin, Y. Eng, Chih-Hsuan Tai, Cheng-Hsin Chen, Yu-Che Chang, Yi-Hsuan Fan
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引用次数: 1

摘要

本文提出并演示了一种利用自对准技术的非经典体系垂直场效应晶体管(BTVFET)。通过仿真,我们发现BTVFET的电学特性优于传统的SOI VFET,包括出色的散热能力、更高的沟道迁移率、更低的寄生电容和更小的栅极漏电流。BTVFET优良的亚阈值摆幅(~77 mV/dec)也很有吸引力。此外,在我们提出的准soi垂直MOSFET中,由于部分绝缘氧化物位于漏极区域下方,因此容易形成浅结。因此,相信BTVFET可以成为未来CMOS缩放的候选器件之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization of a body-tied vertical MOSFET
In this paper, a non-classical body-tied vertical field-effect transistor (BTVFET) utilizing the self-aligned technique is presented and demonstrated. Based on the simulations, we find out that the electrical characteristics of the BTVFET are better than that of the conventional SOI VFET, including the outstanding ability of heat dissipation, higher channel mobility, lower parasitic capacitance, and reduced gate leakage current. The excellent subthreshold swing (~77 mV/dec) of the BTVFET is also attractive. In addition, the shallow junction is easy to form because the partially insulating oxide is under the drain regions in our proposed quasi-SOI vertical MOSFET. Hence, it is believed that the BTVFET can become one of the candidates for future CMOS scaling.
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