{"title":"电子束处理对微通道板发光结构参数及噪声因子的影响","authors":"S. Avdeev, A. Kravchenko, E. Gusev, S. Petrov","doi":"10.1117/12.742340","DOIUrl":null,"url":null,"abstract":"This paper presents invesigation findings of electron-beam influence on parameters and characteristics of trialcali and bialkali photocathocles of vacuum photoelectric devices and electron-beam amplification channels modification of microchannel plate image intensifier (MCP) of the electrooptical transducer. The electron-beam processing (EBP) increases total sensitivity by 10 - 12% and reduces spoilage in photocathode production to a fourth. The noise factor of MCP subjected EBP before recovery procedure MCP, reduces in 1.5 - 2.0 times, the sensibility of electrooptical transducer increases.","PeriodicalId":160828,"journal":{"name":"International Conference on Photoelectronics and Night Vision Devices","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Electron-beam processing effect on photoemitting-structures parameters and the noise factor of microchannel plates\",\"authors\":\"S. Avdeev, A. Kravchenko, E. Gusev, S. Petrov\",\"doi\":\"10.1117/12.742340\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents invesigation findings of electron-beam influence on parameters and characteristics of trialcali and bialkali photocathocles of vacuum photoelectric devices and electron-beam amplification channels modification of microchannel plate image intensifier (MCP) of the electrooptical transducer. The electron-beam processing (EBP) increases total sensitivity by 10 - 12% and reduces spoilage in photocathode production to a fourth. The noise factor of MCP subjected EBP before recovery procedure MCP, reduces in 1.5 - 2.0 times, the sensibility of electrooptical transducer increases.\",\"PeriodicalId\":160828,\"journal\":{\"name\":\"International Conference on Photoelectronics and Night Vision Devices\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Photoelectronics and Night Vision Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.742340\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Photoelectronics and Night Vision Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.742340","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electron-beam processing effect on photoemitting-structures parameters and the noise factor of microchannel plates
This paper presents invesigation findings of electron-beam influence on parameters and characteristics of trialcali and bialkali photocathocles of vacuum photoelectric devices and electron-beam amplification channels modification of microchannel plate image intensifier (MCP) of the electrooptical transducer. The electron-beam processing (EBP) increases total sensitivity by 10 - 12% and reduces spoilage in photocathode production to a fourth. The noise factor of MCP subjected EBP before recovery procedure MCP, reduces in 1.5 - 2.0 times, the sensibility of electrooptical transducer increases.
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