65 nm超高密度双端口SRAM, 0.71um/sup ~/ 8T-Cell用于SoC

K. Nii, Y. Masuda, M. Yabuuchi, Y. Tsukamoto, S. Ohbayashi, S. Imaoka, M. Igarashi, K. Tomita, N. Tsuboi, H. Makino, K. Ishibashi, H. Shinohara
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引用次数: 15

摘要

我们提出了一种新的同步双端口(DP) SRAM的接入方案,该方案可以最大限度地减少8t -DP小区的面积并保持小区的稳定性。优先行解码器电路和移位位线访问方案消除了访问冲突问题。采用65nm CMOS技术(hp90),我们制作了32KB的DP-SRAM宏。我们得到了0.71mum2 8t - dp电池,其电池尺寸是6t -单端口(SP)电池的1.44倍
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 65 nm Ultra-High-Density Dual-Port SRAM with 0.71um/sup ~/ 8T-Cell for SoC
We propose a new access scheme of synchronous dual-port (DP) SRAM that minimizes area of 8T-DP-cell and keeps cell stability. A priority row decoder circuit and shifted bit-line access scheme eliminates access conflict problem. Using 65nm CMOS technology (hp90), we fabricated 32KB DP-SRAM macros with the proposed scheme. We obtain 0.71mum2 8T-DP-cell, which cell size is 1.44times larger than 6T-single-port (SP) cell
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