硫系薄膜光致双折射的偏振依赖性

Sun-Joo Jang, Cheol-Ho Yeo, Jeong-Il Park, Hyun-Young Lee, Hong-Bay Chung
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引用次数: 2

摘要

本研究以633 nm的He-Ne激光器作为抽吸光束,780 nm的半导体激光器作为探测光束,研究了As/sub 40/Ge/sub 10/Se/sub 15/S/ S/ 35/硫族化物薄膜中光致双折射(PB)、/spl Delta/n的偏振依赖性。同时,研究了线性、圆形、椭圆偏振态的PB变换。利用/spl λ //4波片产生圆形、椭圆形的偏振态。薄膜厚度约为0.9 /spl mu/m,接近抽运光穿透深度的最佳厚度1 /spl mu/m。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Polarization dependence of photoinduced birefringence in chalcogenide thin film
In this study, we have investigated the polarization dependence of photoinduced birefringence (PB), /spl Delta/n in As/sub 40/Ge/sub 10/Se/sub 15/S/sub 35/ chalcogenide thin film with a He-Ne Laser at 633 nm as a pumping beam and a semiconductor laser at 780 nm as a probing beam. Also, the PB transformation for polarization states-linear, circular, elliptical polarization-was investigated. The polarization state of circular, elliptical was produced using a /spl lambda//4 wave plate. The thickness of the film is about 0.9 /spl mu/m which was made close to the optimal thickness, 1 /spl mu/m, which is the penetration depth of the pumping light.
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