GaSb/GaAs量子点表面上GaAs帽层的生长过程

K. Uesugi, M. Sato, Y. Idutsu, I. Suemune
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引用次数: 2

摘要

采用stranski - krstanow生长模式,利用金属-有机分子束外延在GaAs(001)表面生长自组装GaSb量子点(QDs)。通过改变生长温度(400℃~ 510℃),可以控制GaSb量子点在5倍108 cm-2 ~ 4倍1010 cm-2范围内的密度。在450℃以上的温度下,用三甲基三胺酸和三甲基三胺酸锑对GaSb量子点进行了刻蚀。在GaAs帽生长过程中,GaSb/GaAs量子点的发光表现为Sb被As原子取代而发生蓝移。为了实现长波发射,提出了GaAs帽层的两步生长方法。400℃时在相邻GaSb量子点之间的台阶表面生长GaAs量子点结构,450℃时生长GaAs层将GaSb和GaAs量子点埋藏。结果表明,GaSb/GaAs量子点的发光峰红移达到1.22 μ m,发光效率有所提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth Process of GaAs Cap Layers on GaSb/GaAs Quantum Dot Surfaces
Self-assembled GaSb quantum dots (QDs) have been grown on GaAs(001) surface by metal-organic molecular beam epitaxy in the Stranski-Krastanow growth mode. The density of GaSb QDs in a wide range from 5times108 cm-2 to 4times1010 cm-2 can be controlled by changing the growth temperature between 400degC and 510degC. Etching of GaSb QDs was observed by the supply of trisdimethylaminoarcenic and trisdimethylaminoantimony at the temperature above 450degC. Luminescence from the GaSb/GaAs QDs showed a blue shift by the replacement of Sb with As atoms during GaAs cap growth. To realize long-wavelength emission, 2-step growth of GaAs cap layer was proposed. After GaAs QD structure was grown on the terrace surface between neighboring GaSb QDs at 400degC, the GaAs layer was grown to bury the GaSb and GaAs QDs at 450degC. The red shift of the luminescence peak up to 1.22 mum and the improvement of luminescent efficiency of GaSb/GaAs QDs were observed.
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