实现金刚石上氮化镓的最佳热性能

J. Pomeroy, M. Bernardoni, A. Sarua, A. Manoi, D. Dumka, D. Fanning, Martin Kuball
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引用次数: 51

摘要

基于GaN的射频晶体管提供了令人印象深刻的功率密度,尽管要实现GaN提供的最大潜力,必须改进热管理,以超越当前的GaN-on- sic器件。通过使用金刚石而不是SiC衬底,晶体管的热阻可以显著降低。重要的是通过实验验证热阻,而不是仅仅依赖于模拟期望,使用测量结果来帮助进一步优化。本文提出的新型热表征方法将拉曼热成像和模拟相结合,以确定GaN-on-金刚石器件中的衬底导热系数和GaN/衬底热阻。测量到的gan -on-金刚石界面热阻与报道的GaN-on-SiC界面热阻相似,而金刚石衬底的热导率要高得多,这使得相对于GaN-on-SiC的热阻得到了显著改善,并且具有进一步改善的巨大潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Achieving the Best Thermal Performance for GaN-on-Diamond
GaN-based RF transistors offer impressive power densities, although to achieve the maximum potential offered by GaN, thermal management must be improved beyond the current GaN-on-SiC devices. By using diamond, rather than SiC substrates, transistor thermal resistance can be significantly reduced. It is important to experimentally verify thermal resistance, rather than relying solely on simulation expectations, using measurement results to aid further optimization. The novel thermal characterization methodology presented here combines Raman thermography and simulation to determine the substrate thermal conductivity and GaN/substrate thermal resistance in GaN-on-diamond devices. Measured GaN-on-diamond interfacial thermal resistance is similar to reported values for GaN-on-SiC, whereas the diamond substrate thermal conductivity is substantially higher, resulting in a significantly improved thermal resistance with respect to GaN-on-SiC, with great potential for further improvement.
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