用片上监视器表征和补偿性能变化

Islam A. K. M. Mahfuzul, H. Onodera
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引用次数: 8

摘要

积极的技术规模和对降低电源电压的强烈需求对实现稳健和节能的电路运行提出了严峻的挑战。本文首先概述了变异性弹性的电路技术,包括性能和变异性监测的片上电路。然后,我们将重点放在用于晶体管性能估计的片上延迟单元以及用于模对模(D2D)和模内(WID)可变性提取的均匀和非均匀环形振荡器上。我们还解释了拓扑可重构的片上监视器,用于原位可变性表征,可用于D2D和WID可变性建模。该监测器还可用于监测时间变化,如随机电报噪声(RTN)。补偿性能可变性可以通过局部身体偏置与片上监视器完成。在65nm制程中制造的概念验证电路将被演示,这样在慢制程角制造的测试芯片可以通过补偿在典型制程条件下达到目标性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization and compensation of performance variability using on-chip monitors
Aggressive technology scaling and strong demand for lowering supply voltage impose a serious challenge in achieving robust and energy-efficient circuit operation. This paper first overviews circuit techniques for variability resilience including on-chip circuits for performance and variability monitoring. We then focus on on-chip delay cells for transistor performance estimation and homogeneous and inhomogeneous ring oscillators for Die-to-Die (D2D) and Within-Die (WID) variability extraction. We also explain topology-reconfigurable on-chip monitors for in-situ variability characterization which can be used for D2D and WID variability modeling. The monitor can also be used for monitoring temporal variability such as Random Telegraph Noise (RTN). Compensation of performance variability can be done by a localized body biasing with on-chip monitors. A proof-of-concept circuit fabricated in a 65 nm process will be demonstrated such that a test chip fabricated at the slow process corner can achieve a target performance under the typical process condition by the compensation.
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