157nm光刻用kHz F/sub / 2激光器的研制

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797478

S. Nagai, T. Enami, T. Nishisaka, J. Fujimoto, O. Wakabayashi, H. Mizoguchi

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引用次数: 3

摘要

研制了一种用于157nm微光刻的高重复率放电泵浦氟分子激光器。我们开发了一种高达800 Hz的高重复频率固态脉冲功率模块(SSPPM)。该激光器采用由MgF/sub - 2/高反射平面镜和MgF/sub - 2/输出耦合器组成的稳定谐振腔，对VUV光具有较高的透光率和耐久性。为了避免由于O/sub - 2/的吸收而导致157 nm辐射的衰减，包括光学元件和探测器在内的所有光路都连续使用至少低于100 ppm O/sub - 2/浓度的纯氮进行冲洗。

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Development of kHz F/sub 2/ laser for 157 nm lithography

We have been developing a high repetition rate discharge-pumped molecular fluorine laser for 157 nm microlithography. We have developed a high repetition rate solid state pulsed power module (SSPPM) up to 800 Hz. This laser adopts a stable resonator composed of a MgF/sub 2/ high reflection plane mirror and a MgF/sub 2/ output coupler, which show high transmittance and durability for VUV light. To avoid attenuation of the 157 nm radiation due to the absorption of O/sub 2/, all the optical path including optics and detectors are continually flushed by pure nitrogen at least below 100 ppm O/sub 2/ concentration.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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