VHSIC/VLSIC器件对2000年电磁环境的预估敏感度

H. W. Denny
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引用次数: 5

摘要

通过适当掺杂IIIA类和IVA类过渡元素(主要是锗、硅和镓)和选定的杂质,可以获得具有检测、放大和开关性能的半导体器件。最初,二极管和晶体管分别是作为单pn结或pnp/npn结组在硅和锗衬底上制造的。下一个合乎逻辑的步骤是在一个共同的衬底上集成有序的二极管和晶体管,以生产功能电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Projected Susceptibilities of VHSIC/VLSIC Devices to the Year 2000 Electromagnetic Environment
With proper doping of Class IIIA and IVA transitional elements (primarily germanium, silicon, and gallium) with selected impurities, semiconducting devices offering detection, amplification, and switching properties are obtainable. Originally, diodes and transistors were fabricated on silicon and germanium substrates only as single pn junctions or as pnp/npn junction sets, respectively. The next logical step was the integration of ordered sets of diodes and transistors on a common substrate to produce functional circuits.
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