单片光学和量子效应器件对GaAs集成电路性能的电子学外延增强

C. Fonstad, J. Ahadian, S. G. Patterson, P. Vaidyanathan, Y. Royter, G. Petrich, L. Kolodziejski, S. Prasad
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引用次数: 1

摘要

描述了一种集成技术,即电子外延(EoE),其中光电和量子效应器件异质结构在完全加工的GaAs集成电路芯片上生长,随后加工成与现有电路单片集成的器件。利用这种技术,人们可以通过在传统集成电子电路中添加先进的异质结构量子效应和光电子器件来实现性能和功能的提高,而无需开发全新的VLSI技术。解释了EoE技术的细节,并给出了包含led,探测器和MESFET电子器件的光电集成电路的示例。OPTOCHIP项目是EoE研究的原型OEIC代工,并致力于将谐振隧道二极管集成到EoE中以形成单晶体管GaAs静态随机存取存储单元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epitaxy-on-electronics enhancement of GaAs IC performance with monolithic optical and quantum-effect devices
An integration technique, epitaxy-on-electronics (EoE), is described wherein optoelectronic and quantum effect device heterostructures are grown on fully processed GaAs integrated circuit chips and subsequently processed into devices monolithically integrated with the pre-existing circuitry. Using this technique, one can realize the increased performance and functionality promised by adding advanced heterostructure quantum effect and optoelectronic devices to conventional integrated electronic circuitry, without developing a complete new VLSI technology. The details of the EoE technology are explained, and examples of optoelectronic integrated circuits incorporating LEDs, detectors, and MESFET electronics are presented. The OPTOCHIP Project, a prototype EoE research OEIC foundry, and work on EoE integration of resonant tunneling diodes to form one-transistor GaAs static random access memory cells, are also described.
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