可见(639nm /spl ngt/ /spl lambda/ /spl ngt/ 661nm)垂直腔面发射激光二极管

J. A. Lott, R. P. Schneider, K. Malloy
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引用次数: 1

摘要

我们最近报道了使用AlAs/AlGaAs分布式Bragg反射器(DBRs)~和InAlPDnAlGaP DBRs2制备InGaP/InAlGaP应变量子阱可见垂直腔面发射激光器(VCSEL)的光泵浦激光。我们还研究了这些有前途的器件中电注入的关键问题,现在报告了第一个可见VCSEL二极管的演示。在室温脉冲激发下,器件在639.1 nm到660.7 nm的范围内以单一纵向模式激光,这取决于晶圆的位置。该结构通过金属有机气相外延(MOVPE)在GaAs衬底上生长,由一个由AlGaAs dbr包围的InAlGaP光学腔活性区组成。底部掺硅DBR由55.5个周期交替的AlAs和Al,Gal-,As (x = 0.5)四分之一波层组成,每个界面有x = 0.75的势垒还原层,以降低串联电阻。采用相同的36周期掺c顶部耦合DBR,包括(p+) GaAs金属接触层。InAlGaP光腔包含三个In0.56Gao。&阶跃梯度势垒分离约束构型中的应变量子阱。通过研究具有InAlGaP有源区和AlGaAs DBR包层的边缘发射激光器的性能,优化了器件注入效率。制作了增益引导“蚀刻桩”测试装置。顶部环空接触定义了发射直径为10pm和20pm,径向厚度为5pm,因此,注入电流的很大一部分不是直接用于激光,而是用于器件加热。尽管如此,在室温下,在未旋转的晶圆上测量了639.1 nm至660.7 nm的激光波长,没有热沉降。脉冲激励为- 100 ns脉冲,频率为10 kHz至IMHz。许多设备在1MHz时继续以高达40%的占空比进行激光发射。较大的器件通常在2.7 V时具有30ma的阈值。峰值输出功率为3.38 mW,电阻小于150。通过更复杂的器件加工技术,有望大幅提高性能。这是InAlGaP可见VCSEL二极管的首次演示。这项工作为先进的设备应用打开了大门,如塑料光纤通信、显示阵列、互连和全息存储器,以及一些扫描应用代替HeNe激光器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Visible (639 nm /spl ngt/ /spl lambda/ /spl ngt/ 661 nm) vertical cavity surface emitting laser diodes
We have recently reported optically-pumped lasing in an InGaP/InAlGaP strained quantum well visible vertical cavity surface emitting laser (VCSEL) with both AlAs/AlGaAs distributed Bragg reflectors (DBRs)~ and with InAlPDnAlGaP DBRs2. We have also studied the critical issues for electrical injection in these promising devices and now report the demonstration of the first visible VCSEL diodes. At room temperature with pulsed excitation, the devices lase in a single longitudinal mode within 639.1 nm to 660.7 nm, depending on wafer position. The structures were grown by metalorganic vapor-phase epitaxy (MOVPE) on GaAs substrates and consist of an InAlGaP optical cavity active region surrounded by AlGaAs DBRs. The bottom Si-doped DBR consists of 55.5 periods of alternating AlAs and Al,Gal-,As (x = 0.5) quarter-wave layers with x = 0.75 barrier reduction layers at each interface to reduce series resistance. An identical 36 period C-doped top coupling DBR is used and includes a (p+) GaAs metal contact layer. The InAlGaP optical cavity contains three In0.56Gao.& strained quantum wells in a step graded-barrier separate confinement configuration. Device injection efficiency was optimized by studying the performance of edge-emitting lasers with InAlGaP active regions and AlGaAs DBR cladding layers. Gain-guided "etched post" test devices were fabricated. A top annulus contact defines emitting diameters of 10 pm and 20 pm with a 5 pm radial thickness, thus, a large percentage of the injected current does not directly contribute to lasing but to device heating. Despite this, lasing wavelengths from 639.1 nm to 660.7 nm were measured, on unrotated wafers, at room temperature without heat-sinking. The pulsed excitation was - 100 ns pulses at 10 kHz to IMHz. Many devices continued lasing with up to a 40% duty cycle at 1MHz. The larger devices typically have a threshold of 30 mA at 2.7 V. The peak output power is 3.38 mW with a resistance of less than 15 0. Substantially improved performance is expected with more sophisticated device processing techniques. This is the first demonstration of InAlGaP visible VCSEL diodes. This work opens the door for advanced device applications such as plastic fiber communications, arrays for displays, interconnects, and holographic memory, and some scanning applications in place of HeNe lasers.
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