c掺杂GaN缓冲液中GaN hemt中热电子分布的独特晶格温度依赖演化及其可靠性后果

R. R. Chaudhuri, Vipin Joshi, Amratansh Gupta, Tanmay Joshi, R. Malik, Mehak Ashraf Mir, Sayak Dutta Gupta, M. Shrivastava
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引用次数: 0

摘要

通过这项工作,报道了c掺杂GaN缓冲液上GaN hemt中热电子分布的独特衬底温度依赖演化,并讨论了其可靠性后果。随着衬底温度的升高,在漏极边缘观察到热电子浓度、能量和与缓冲陷阱的相互作用显著上升,与预期的热电子数量减少相反。提出了一种基于载流子脱捕和输运的机制,并进行了实验验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Unique Lattice Temperature Dependent Evolution of Hot Electron Distribution in GaN HEMTs on C-doped GaN Buffer and its Reliability Consequences
Through this work, a unique substrate temperature dependent evolution of hot electron distribution is reported in GaN HEMTs on C-doped GaN buffer, and its reliability consequences are discussed. With rise in substrate temperature, significant rise in hot electron concentration, its energy, and interaction with buffer traps is observed at the drain edge, in contrast to an expected reduction in hot electron population. A mechanism based on carrier de-trapping and transport to drain is proposed and experimentally validated.
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