部分耗尽SOI CMOS电路中栅极延迟变异性的详细分析

I. Aller, K. Kroell
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引用次数: 9

摘要

使用部分耗尽(PD) SOI fet的电路设计必须考虑取决于电路开关历史的可变门延迟(Gautier等人,1997;Houston and Unnikrishnan, 1998)。为了充分利用SOI的优势,理解和分析这种“历史效应”并考虑它们来优化设计策略是很重要的。在本文中,我们描述了一种适合分析PD SOI CMOS电路的方法,包括一种用于动态平衡计算的新算法,由于身体电位的演变非常缓慢(时间常数高达ms (Assaderaghi et al., 1996)),这一任务在标准电路模拟器中是不可行的。给出了0.2 /spl mu/m工艺的仿真结果,说明了设计和应用参数对历史效应的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Detailed analysis of the gate delay variability in partially depleted SOI CMOS circuits
Circuit design using partially depleted (PD) SOI FETs must take into account a variable gate delay which is dependent on the switching history of the circuits (Gautier et al, 1997; Houston and Unnikrishnan, 1998). In order to fully exploit the advantages of SOI, it is important to understand and analyze such 'history effects' and consider them for an optimized design strategy. In this paper, we describe a methodology suitable to analyze PD SOI CMOS circuits, including a new algorithm for dynamic equilibrium computations, a task that is not practicable with standard circuit simulators because of the very slow evolution of the body potential (time constants up to ms (Assaderaghi et al., 1996)). Simulation results for a 0.2 /spl mu/m technology are given, showing the importance of design and application parameters with regard to the history effect.
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