多孔硅多层结构的制备及光声表征

L. Chepela, P. Lishchuk, V. Shevchenko, V. Kuryliuk, Elysaveta Polishchuk, A. Kuzmich, P. Teselko, I. Matushko, M. Borovyi
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引用次数: 0

摘要

本文主要研究了多层多孔硅结构的制备条件对其结构和热性能的影响。采用电化学刻蚀法制备了高掺杂单晶硅晶片。蚀刻是在化学溶液有/无机械混合的情况下进行的。利用光学显微镜和扫描电镜对合成结构的形态和结构特性进行了研究。在经典结构下,用气传声器光声技术测定了实验热导率随腐蚀条件的变化。研究发现,样品制备过程中电解质的混合过程显著影响了样品的形态特征,从而改善了结构中的热传递。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication and Photoacoustic Characterization of Multilayered Structures Based on Porous Silicon
This paper is devoted to the study of the fabrication conditions on the structural and thermal properties of multilayered porous silicon structures. The samples were prepared by electro-chemical etching of highly-doped monocrystalline silicon wafer. The etching was conducted with/without mechanical mixing of chemical solution. Morphological and structural properties of synthesized structures were investigated by optical and scanning electron microscopy. The experimental thermal conductivity values versus etching conditions were determined by gas-microphone photoacoustic technique in classic configuration. It was found that the process of electrolyte mixing during sample preparation significantly affects its morphological features, and thus improves thermal transport in the structure.
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