基于模型的MPC在先进掩模制造中的作用

I. Bork, P. Buck
{"title":"基于模型的MPC在先进掩模制造中的作用","authors":"I. Bork, P. Buck","doi":"10.1117/12.2281894","DOIUrl":null,"url":null,"abstract":"This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"The role of model-based MPC in advanced mask manufacturing\",\"authors\":\"I. Bork, P. Buck\",\"doi\":\"10.1117/12.2281894\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.\",\"PeriodicalId\":287066,\"journal\":{\"name\":\"European Mask and Lithography Conference\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Mask and Lithography Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2281894\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2281894","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

本文介绍了基于模型的MPC在14nm及以上节点掩模制造中的应用,分析了引入MPC的要求和挑战,并强调了其在掩模制造过程中的优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The role of model-based MPC in advanced mask manufacturing
This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信