{"title":"基于模型的MPC在先进掩模制造中的作用","authors":"I. Bork, P. Buck","doi":"10.1117/12.2281894","DOIUrl":null,"url":null,"abstract":"This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"The role of model-based MPC in advanced mask manufacturing\",\"authors\":\"I. Bork, P. Buck\",\"doi\":\"10.1117/12.2281894\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.\",\"PeriodicalId\":287066,\"journal\":{\"name\":\"European Mask and Lithography Conference\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Mask and Lithography Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2281894\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2281894","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The role of model-based MPC in advanced mask manufacturing
This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.
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