{"title":"DARPA COSMOS项目:融合InP和硅CMOS技术实现高性能混合信号","authors":"S. Raman, Tsu-Hsi Chang, C. L. Dohrman, M. Rosker","doi":"10.1109/ICIPRM.2010.5516241","DOIUrl":null,"url":null,"abstract":"The COmpound Semiconductor Materials On Silicon (COSMOS) program of the U.S. Defense Advanced Research Projects Agency (DARPA) focuses on developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices with high-density silicon circuits. The technical approaches being explored in this program include high-density micro assembly, monolithic epitaxial growth, and epitaxial layer printing processes. In Phase I of the program, performers successfully demonstrated world-record differential amplifiers through heterogeneous integration of InP HBTs with commercially fabricated CMOS circuits. In the current Phase II, complex wideband, large dynamic range, high-speed digital-to-analog convertors (DACs) are under development based on the above heterogeneous integration approaches. These DAC designs will utilize InP HBTs in the critical high-speed, high-voltage swing circuit blocks and will employ sophisticated in situ digital correction techniques enabled by CMOS transistors. This paper will also discuss the Phase III program plan as well as future directions for heterogeneous integration technology that will benefit mixed signal circuit applications.","PeriodicalId":197102,"journal":{"name":"2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"30","resultStr":"{\"title\":\"The DARPA COSMOS program: The convergence of InP and Silicon CMOS technologies for high-performance mixed-signal\",\"authors\":\"S. Raman, Tsu-Hsi Chang, C. L. Dohrman, M. Rosker\",\"doi\":\"10.1109/ICIPRM.2010.5516241\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The COmpound Semiconductor Materials On Silicon (COSMOS) program of the U.S. Defense Advanced Research Projects Agency (DARPA) focuses on developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices with high-density silicon circuits. The technical approaches being explored in this program include high-density micro assembly, monolithic epitaxial growth, and epitaxial layer printing processes. In Phase I of the program, performers successfully demonstrated world-record differential amplifiers through heterogeneous integration of InP HBTs with commercially fabricated CMOS circuits. In the current Phase II, complex wideband, large dynamic range, high-speed digital-to-analog convertors (DACs) are under development based on the above heterogeneous integration approaches. These DAC designs will utilize InP HBTs in the critical high-speed, high-voltage swing circuit blocks and will employ sophisticated in situ digital correction techniques enabled by CMOS transistors. This paper will also discuss the Phase III program plan as well as future directions for heterogeneous integration technology that will benefit mixed signal circuit applications.\",\"PeriodicalId\":197102,\"journal\":{\"name\":\"2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-07-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"30\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2010.5516241\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2010.5516241","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The DARPA COSMOS program: The convergence of InP and Silicon CMOS technologies for high-performance mixed-signal
The COmpound Semiconductor Materials On Silicon (COSMOS) program of the U.S. Defense Advanced Research Projects Agency (DARPA) focuses on developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices with high-density silicon circuits. The technical approaches being explored in this program include high-density micro assembly, monolithic epitaxial growth, and epitaxial layer printing processes. In Phase I of the program, performers successfully demonstrated world-record differential amplifiers through heterogeneous integration of InP HBTs with commercially fabricated CMOS circuits. In the current Phase II, complex wideband, large dynamic range, high-speed digital-to-analog convertors (DACs) are under development based on the above heterogeneous integration approaches. These DAC designs will utilize InP HBTs in the critical high-speed, high-voltage swing circuit blocks and will employ sophisticated in situ digital correction techniques enabled by CMOS transistors. This paper will also discuss the Phase III program plan as well as future directions for heterogeneous integration technology that will benefit mixed signal circuit applications.