在蚀刻工具中使用Y2O3材料进行颗粒还原

2007 International Symposium on Semiconductor Manufacturing Pub Date : 2007-10-01 DOI:10.1109/ISSM.2007.4446866

K. Miwa, T. Sawai, M. Aoyama, F. Inoue, A. Oikawa, K. Imaoka

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引用次数: 6

摘要

在带有Al2O3窗口的加工工具中，在蚀刻晶圆上检测金属线之间的颗粒。推测该颗粒来源于室内氟化Al2O3表面。在本文中，描述了在腔室内使用Y2O3材料来减少这类颗粒的尝试。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Particle reduction using Y2O3 material in an etching tool

Particles between metal lines were detected on etched wafers in a process tool with an Al2O3 window on top of the chamber. The particle was speculated to be derived from fluorinated Al2O3 surface in the chamber. In this paper, an attempt was described to reduce that kind of particles by using Y2O3 material within the chamber.

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2007 International Symposium on Semiconductor Manufacturing

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