FDSOI技术中射频/毫米波应用的新型HCI可靠性模型

W. Arfaoui, G. Bossu, A. Muehlhoff, D. Lipp, R. Manuwald, T. Chen, T. Nigam, M. Siddabathula
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引用次数: 11

摘要

虽然深度亚微米技术可以提高半导体集成度,但高度集成电路对最微小的参数漂移变得越来越敏感。热载流子注入(HCI)是最近技术中参数退化的主要原因之一,这是一种渐进式磨损现象,其理解和建模已成为新的CMOS节点的必要条件。因此,我们在本文中提出了一个新的全耗尽绝缘体上硅(FDSOI) mosfet的HCI可靠性模型,该模型涵盖了射频/毫米波(射频/毫米波)应用,并考虑了反向偏置操作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Novel HCI Reliability Model for RF/mmWave Applications in FDSOI Technology
Although technology scaling to deep submicron enable higher degrees of semiconductor integration, highly integrated circuit have become increasingly sensitive to the slightest parameter drift. One of the main causes of parameter degradation in recent technologies is the Hot Carrier Injection (HCI), a progressive wear out phenomenon whose understanding and modeling has become mandatory in new CMOS nodes. Therefore, we present in this paper a new HCI reliability model for Fully Depleted Silicon On Insulator (FDSOI) MOSFETs which covers the RF/mmWave (Radiofrequency /millimeter wave) applications taking into account back bias operation.
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