垂直排列MOCVD法制备ZnO薄膜的空间分析

2014 11th Annual High Capacity Optical Networks and Emerging/Enabling Technologies (Photonics for Energy) Pub Date : 2014-12-01 DOI:10.1109/HONET.2014.7029363

P. Mishra, Rahi Patel, B. Hussain, Justin Stansell, B. Kucukgok, M. Raja, N. Lu, I. Ferguson

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引用次数: 9

摘要

采用自制的金属有机化学气相沉积装置，以非中心对称槽为衬底，制备了氧化锌薄膜。在相对恒定的厚度和不同的温度下生长的薄膜在五个不同的点上使用光致发光光谱，非原位光谱反射率和非原位透射率测量进行测试。对实验结果进行了分析，以评价ZnO薄膜的厚度和光学特性的空间一致性。

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Spatial analysis of ZnO thin films prepared by vertically aligned MOCVD

Zinc Oxide thin films were grown using a homemade metallorganic chemical vapor deposition apparatus with a non-centrosymmetric groove for the substrate. Films grown with relatively constant thickness and varying temperatures were tested using photoluminescence spectrometry, ex-situ spectral reflectance, and ex-situ transmittance measurements at five distinct points. Results are analyzed to evaluate the spatial consistency in thickness and optical characteristics of the ZnO films.

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来源期刊

2014 11th Annual High Capacity Optical Networks and Emerging/Enabling Technologies (Photonics for Energy)

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