Ryo Ono, Shinya Imai, T. Kawanago, I. Muneta, K. Kakushima, K. Tsutsui, Tetsuya Tatsumi, S. Tomiya, H. Wakabayashi
{"title":"PVD非晶MoSx膜固相结晶法改善MoS2膜质量","authors":"Ryo Ono, Shinya Imai, T. Kawanago, I. Muneta, K. Kakushima, K. Tsutsui, Tetsuya Tatsumi, S. Tomiya, H. Wakabayashi","doi":"10.1109/EDTM55494.2023.10103089","DOIUrl":null,"url":null,"abstract":"Physical vapor deposited Mos2 film was improved via solid-phase crystallization (SPC) from the amorphous phase. Under the same SPC conditions, better film quality was observed for an amorphous-MoSx (a- MoSx) film than for a well-crystallized Mos2 film. This result is attributed to the S/Mo ratio in the a-MoSx film before SPC being greater than that in the well-crystallized film, indicating that the a-MoSx film contained sufficient sulfur prior to the SPC.","PeriodicalId":418413,"journal":{"name":"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film\",\"authors\":\"Ryo Ono, Shinya Imai, T. Kawanago, I. Muneta, K. Kakushima, K. Tsutsui, Tetsuya Tatsumi, S. Tomiya, H. Wakabayashi\",\"doi\":\"10.1109/EDTM55494.2023.10103089\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Physical vapor deposited Mos2 film was improved via solid-phase crystallization (SPC) from the amorphous phase. Under the same SPC conditions, better film quality was observed for an amorphous-MoSx (a- MoSx) film than for a well-crystallized Mos2 film. This result is attributed to the S/Mo ratio in the a-MoSx film before SPC being greater than that in the well-crystallized film, indicating that the a-MoSx film contained sufficient sulfur prior to the SPC.\",\"PeriodicalId\":418413,\"journal\":{\"name\":\"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-03-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDTM55494.2023.10103089\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDTM55494.2023.10103089","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film
Physical vapor deposited Mos2 film was improved via solid-phase crystallization (SPC) from the amorphous phase. Under the same SPC conditions, better film quality was observed for an amorphous-MoSx (a- MoSx) film than for a well-crystallized Mos2 film. This result is attributed to the S/Mo ratio in the a-MoSx film before SPC being greater than that in the well-crystallized film, indicating that the a-MoSx film contained sufficient sulfur prior to the SPC.