Fe3O4外延异质结构中价带特征的应变诱导修饰

I. Singh, S. Arora, R. Choudhary
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引用次数: 0

摘要

本文系统地研究了Fe3O4/Si(100)和Fe3O4/MgO(100)外延异质结构的晶格错配应变和应变弛豫诱导的价带电子结构修饰。利用角积分光谱学(AIPES)研究了室温下45 ~ 65 eV范围内Si(100)和MgO(100)衬底上的Fe3O4薄膜。随着薄膜应变状态的不同,拉曼模式和Verwey转变温度与相应的体值存在偏差。2.7 eV (3.5 eV)的价带特征随着应变的增加(减少)向费米能级移动,导致少数自旋Fe(A) 3d-eg带(多数自旋Fe(B) 3d-t2g带)的态密度(DOS)减小(增加)。这种效应在MgO(100)衬底上的薄膜比在Si(100)衬底上的薄膜更为明显。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Strain Induced Modifications of Valence Band Features in Fe3O4 Epitaxial Heterostructures
We report systematic investigations of lattice mismatch strain and the strain relaxation induced modifications on the valence band electronic structure of the epitaxial Fe3O4/Si (100) and Fe3O4/MgO (100) heterostructures. The Fe3O4 films on Si (100) and MgO (100) substrates were investigated though the angle-integrated photoemission spectroscopy (AIPES) at room temperature in the energy range 45-65 eV. Depending on the strain state of the films, the Raman modes and the Verwey transition temperature show deviations from the corresponding bulk values. The valence band feature at 2.7 eV (3.5 eV) shifts towards (away) the Fermi level with an increase (decrease) in strain resulting in decrease (increase) of density of states (DOS) of the minority spin Fe(A) 3d-eg band (majority spin Fe(B) 3d-t2g band). The effect is more pronounced in the case of films on MgO (100) substrate in comparison to the films on Si (100) substrate.
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