一种先进的水滴激光等离子体极紫外光源

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1900-01-01 DOI:10.1364/eul.1996.es89

F. Jin, M. Richardson, G. Shimkaveg, D. Torres

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引用次数: 3

摘要

我们描述了一个激光等离子体EUV源的操作，满足13 nm或11.6 nm投影光刻的所有要求。我们证明了这种基于质量有限的水滴作为激光等离子体目标的源基本上没有碎片，产生窄线EUV发射，连续运行并且实际上成本更低。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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An Advanced EUV source from water droplet laser plasma

We describe the operation of a laser-plasma EUV source that satisfies all the requirements for projection lithography at 13 nm or 11.6 nm. We demonstrate that this source, based on mass-limited water droplets as a laser plasma target is essentially debris-free, produces narrow-line EUV emission, is continuous in operation and is practically cost less.

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Extreme Ultraviolet Lithography (TOPS)

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