晶格极不匹配InP-InSb纳米线异质结构的MOVPE生长和结构表征

B. Borg, M. Messing, P. Caroff, K. Dick, K. Deppert, L. Wernersson
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引用次数: 5

摘要

本文介绍了InP-InSb纳米线异质结构的生长研究和结构表征。与平面外延相比,这种异质结构可以在纳米线中实现而不会形成位错,尽管存在极端的晶格错配(10.4%)。我们在InSb纳米线中获得了高的晶体质量,通过XRD测量了窄的111反射峰。此外,还研究了纳米线生长速率与直径的关系。发现表面生长和纳米线生长之间存在原始竞争,可以通过改变纳米线表面覆盖来控制。最后,HRTEM和X-EDS研究表明,InSb纳米线始终是无缺陷的锌-闪锌矿,并且InP-InSb异质界面没有错配位错,尽管单双平面是常见的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
MOVPE growth and structural charactrization of extremely lattice-mismatched InP-InSb nanowire heterostructures
We present a growth study and structural characterization of InP-InSb nanowire heterostructures. In contrast to planar epitaxy, this heterostructure can be realized in nanowires without the formation of dislocations, despite an extreme lattice-mismatch (10.4%). We obtain high crystal quality in the InSb nanowires, confirmed by a narrow 111 reflection peak measured by XRD. Additionally, the diameter dependence of the nanowire growth rate was investigated. An original competition between surface growth and nanowire growth is found, which can be controlled by varying the nanowire surface coverage. Finally, HRTEM and X-EDS investigations reveal that the InSb nanowire is always defect-free zinc-blende, and that the InP-InSb heterointerface is free from misfit dislocations, although single twin planes are common.
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