大片InGaAs晶体的生长和半导体激光二极管的制造

K. Kinoshita, S. Yoda, H. Aoki, T. Hosokawa, S. Yamamoto, M. Matsushima, M. Arai, Y. Kawaguchi, Y. Kondo, F. Kano
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引用次数: 2

摘要

我们已经成功地将InxGa1−xAs (x: 0.1-0.13)平板单晶的表面积增加到30 ×30 mm2,用于大规模生产激光二极管。关键是要抑制熔体中的对流,并保持恒定的温度梯度,以获得均匀的晶体。生长的晶体具有足够的质量作为1.3 μm激光二极管的衬底。通过测量不同温度下的激光特性和通过单模光纤传输至20公里的误码率,对在这些衬底上制造的激光二极管进行了评估。激光器具有高温稳定性和无误差传输,显示出三元衬底的优点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth of large platy InGaAs crystals and fabrication of semiconductor laser diodes
We have succeeded in increasing size of InxGa1−xAs (x: 0.1–0.13) platy single crystals to 30 ×30 mm2 in surface area for mass production of laser diodes. Key points are to suppress convection in a melt and to keep constant temperature gradient for obtaining homogeneous crystals. Grown crystals have enough quality as substrates for 1.3 μm laser diodes. Fabricated laser diodes on these substrates were evaluated by measuring lasing characteristics at various temperatures and by measuring bit error rate for transmission through a single mode fiber up to 20 km. Lasers showed high temperature stability and error free transmission and showed the merit of ternary substrates.
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