GaAs上生长的应变补偿InGaAs-InGaP超晶格的亚带间和带间光学吸收研究

M. Semtsiv, G. G. Tarasov, H. Kissel, F. Eickemeyer, W. Masselink
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引用次数: 1

摘要

采用气源分子束外延技术在半绝缘[001]GaAs衬底上生长了应变补偿的In/sub 0.32/Ga/sub 0.68/As-In/sub 0.32/Ga/sub 0.68/P超晶格,并对其亚带结构进行了研究。可见光和中红外光透射测量被用来确定1e-2e跃迁的能量作为超晶格结构的函数。得到的1e-2e跃迁最高能量为218 meV,对应波长为5.7 /spl mu/m。In/sub 0.32/Ga/sub 0.68/As与In/sub 0.32/Ga/sub 0.68/P之间的导带偏置在400 ~ 500 meV之间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Intersubband and interband optical absorption study of strain-compensated InGaAs-InGaP superlattices grown on GaAs
Strain-compensated In/sub 0.32/Ga/sub 0.68/As-In/sub 0.32/Ga/sub 0.68/P superlattices have been grown on semiinsulating [001] GaAs substrates using gas-source molecular-beam epitaxy and their subband structures investigated. Both visible and mid-infrared optical transmission measurements were used to determine the energies of the 1e-2e transitions as a function of superlattice structure. The highest energy 1e-2e transition obtained is 218 meV, corresponding to a wavelength of 5.7 /spl mu/m. The conduction band offset between the strained In/sub 0.32/Ga/sub 0.68/As and In/sub 0.32/Ga/sub 0.68/P appears to lie between 400 and 500 meV.
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