Ge/SiGe多量子阱异质结构中电吸收响应的应变工程

L. Lever, Youfang Hu, M. Myronov, Xue-Chao Liu, N. Owens, F. Gardes, I. Marko, Stephen J. Sweeney, Z. Ikonić, D. Leadley, Gra Reed, R. Kelsall
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引用次数: 0

摘要

许多光纤通信系统利用1310纳米的光谱“窗口”,这相当于标准单模光纤(smf)中的零色散。特别是,一些无源光网络(PON)架构使用1310nm作为上游信号,因此可以集成到硅电子光子集成电路中的紧凑,低成本和低功耗的1310nm调制器对于未来的光纤到户(FTTH)应用是非常理想的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Strain engineering of the electroabsorption response in Ge/SiGe multiple quantum well heterostructures
Many fibre-optic telecommunications systems exploit the spectral ‘window’ at 1310 nm, which corresponds to zero dispersion in standard single-mode fibres (SMFs). In particular, several passive optical network (PON) architectures use 1310nm for upstream signals,1 and so compact, low-cost and low-power modulators operating at 1310 nm that can be integrated into Si electronic-photonic integrated circuits would be extremely desireable for futre fibre-to-the-home (FTTH) applications.
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